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Master of Science（Materials Science） >
H09) (Jun.1997 - Mar.1998 >
Please use this identifier to cite or link to this item:
https://hdl.handle.net/10119/2446
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| Title: | ECRスパッタ法によるSrTiO3薄膜のエピタキシャル成長と評価 |
| Authors: | 目黒, 伸也 |
| Authors(alternative): | めぐろ, しんや |
| Keywords: | ECRスパッタ法,SrTiO3,エピタキシャル膜
ECR sputtering,SrTiO3,epitaxal |
| Issue Date: | Mar-1998 |
| Description: |
Supervisor:五味 学
材料科学研究科
修士 |
| Title(English): | Groth and evaluation of SrTiO3 thin films deposited by sputtering |
| Authors(English): | Meguro, Shinya |
| Language: | jpn |
| URI: | https://hdl.handle.net/10119/2446 |
| Appears in Collections: | M-MS. 1997年度(H09) (Jun.1997 - Mar.1998)
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| 502abstract.pdf | | 62Kb | Adobe PDF | View/Open |
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