|
JAIST Repository >
JAIST >
Theses >
Master of Science（Materials Science） >
H12) (Jun.2000 - Mar.2001 >
Please use this identifier to cite or link to this item:
https://hdl.handle.net/10119/2770
|
| Title: | Kelvin法による電荷移動型薄膜の評価 |
| Authors: | 平林, 修 |
| Authors(alternative): | ひらばやし, おさむ |
| Keywords: | ケルビンプローブ、電荷移動錯体、中性イオン性相転移
Kelvin Probe,Charge transfer complex,N-I phase tra |
| Issue Date: | Mar-2001 |
| Description: |
Supervisor:三谷 忠興
材料科学研究科
修士 |
| Title(English): | Charge transfer type thin film studied by Kelvin Probe |
| Authors(English): | Hirabayasi, Osamu |
| Language: | jpn |
| URI: | https://hdl.handle.net/10119/2770 |
| Appears in Collections: | M-MS. 2000年度(H12) (Jun.2000 - Mar.2001)
|
Files in This Item:
| File |
Description |
Size | Format |
|---|
| 1399abstract.pdf | | 275Kb | Adobe PDF | View/Open |
|
All items in DSpace are protected by copyright, with all rights reserved.
|
