JAIST Repository >
JAIST >
Theses >
Master of Science(Materials Science) >
H12) (Jun.2000 - Mar.2001 >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/10119/2770
|
Title: | Kelvin法による電荷移動型薄膜の評価 |
Authors: | 平林, 修 |
Authors(alternative): | ひらばやし, おさむ |
Keywords: | ケルビンプローブ、電荷移動錯体、中性イオン性相転移 Kelvin Probe,Charge transfer complex,N-I phase tra |
Issue Date: | Mar-2001 |
Description: | Supervisor:三谷 忠興 材料科学研究科 修士 |
Title(English): | Charge transfer type thin film studied by Kelvin Probe |
Authors(English): | Hirabayasi, Osamu |
Language: | jpn |
URI: | http://hdl.handle.net/10119/2770 |
Appears in Collections: | M-MS. 2000年度(H12) (Jun.2000 - Mar.2001)
|
Files in This Item:
File |
Description |
Size | Format |
1399abstract.pdf | | 275Kb | Adobe PDF | View/Open |
|
All items in DSpace are protected by copyright, with all rights reserved.
|