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Doctor of Philosophy（Materials Science） >
H19) (Jun.2007 - Mar.2008 >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/10119/4192
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| Title: | Cat-CVD法に用いる触媒体の変性とその抑止法に関する基礎研究 |
| Authors: | 本田, 和広 |
| Authors(alternative): | ほんだ, かずひろ |
| Keywords: | silicide
Cat-CVD |
| Issue Date: | Mar-2008 |
| Description: | Supervisor:松村 英樹
材料科学研究科
博士 |
| Title(English): | Study on Silicidation Process of Tungsten Catalyzer in Catalytic Chemical Vapour Deposition |
| Authors(English): | Honda, Kazuhiro |
| Language: | jpn |
| URI: | http://hdl.handle.net/10119/4192 |
| Appears in Collections: | D-MS. 2007年度(H19) (Jun.2007 - Mar.2008)
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