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このアイテムの引用には次の識別子を使用してください:
http://hdl.handle.net/10119/4966
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| タイトル: | Hydrogen permeation barrier performance characterization of vapor deposited amorphous aluminum oxide films using coloration of tungsten oxide |
| 著者: | Yamada-Takamura, Y.
Koch, F.
Maier, H.
Bolt, H. |
| キーワード: | C. Filtered arc
D. Hydrogen
D. Aluminum oxide
D. Tungsten oxide |
| 発行日: | 2002-04-15 |
| 出版者: | Elsevier |
| 誌名: | Surface and Coatings Technology |
| 巻: | 153 |
| 号: | 2-3 |
| 開始ページ: | 114 |
| 終了ページ: | 118 |
| DOI: | 10.1016/S0257-8972(01)01697-8 |
| 抄録: | Low hydrogen diffusivity and solubility of aluminum oxide make a vapor deposited aluminum oxide (Al_2O_3) film an anticipated hydrogen permeation barrier coating. In this paper, amorphous Al_2O_3 film was deposited using filtered vacuum arc method. As a substrate, vapor deposited amorphous tungsten oxide (WO_3) film was used in order to characterize hydrogen permeation barrier performance of the Al_2O_3 film utilizing coloration of WO_3 when it forms H_xWO_3. The samples were exposed to the flux and angular quantified atomic hydrogen beam, and the degree of coloration was characterized by visible to near infrared range transmission spectroscopy. Using this method, a half-micron thick amorphous Al_2O_3 film reducing atomic hydrogen reaching the underlying WO_3 film to 3 ×10^<-4> was measured. Furthermore, Al_2O_3 film as thin as 20 nm showed atomic hydrogen reduction of 4 × 10^<-3>. The results indicate effectiveness of thin vapor deposited Al_2O_3 film as a permeation barrier against atomic hydrogen. |
| Rights: | NOTICE: This is the author's version of a work accepted for publication by Elsevier. Y. Yamada-Takamura, F. Koch, H. Maier and H. Bolt, Surface and Coatings Technology, 153(2-3), 2002, 114-118, http://dx.doi.org/10.1016/S0257-8972(01)01697-8 |
| URI: | http://hdl.handle.net/10119/4966 |
| 資料タイプ: | author |
| 出現コレクション: | c10-1. 雑誌掲載論文 (Journal Articles)
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