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このアイテムの引用には次の識別子を使用してください:
http://hdl.handle.net/10119/8173
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タイトル: | Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing |
著者: | Ohdaira, Keisuke Fujiwara, Tomoko Endo, Yohei Nishizaki, Shogo Matsumura, Hideki |
キーワード: | soda lime glass flash lamp annealing crystallization amorphous silicon polycrystalline silicon solar cell |
発行日: | 2008-11-14 |
出版者: | The Japan Society of Applied Physics |
誌名: | Japanese Journal of Applied Physics |
巻: | 47 |
号: | 11 |
開始ページ: | 8239 |
終了ページ: | 8242 |
DOI: | 10.1143/JJAP.47.8239 |
抄録: | We have succeeded in forming polycrystalline silicon (poly-Si) films with thicknesses of over 4 μm on soda lime glass by flash lamp annealing (FLA) of precursor amorphous Si (a-Si) films deposited by catalytic chemical vapor deposition (Cat-CVD). The insertion of Cr thin films between glass substrates and a-Si significantly improves the adhesion of Si films to the glass substrates, resulting in uniform crystallization of a-Si in 20 × 20 mm^2 area. Several types of substrate, such as quartz substrates, are also used instead of soda lime glass to elucidate the effects of the properties of glass substrates on formation of the poly-Si films. A-Si films tend to be crystallized under lower irradiance than those on quartz glass substrates, which can be described by the lower thermal conductivity and the thermal diffusion length of soda lime glass. Raman spectra of the poly-Si films on soda lime glass show high crystallinity close to unity. The utilization of soda lime glass with poor thermal resistivity is of great importance for the cost-effective mass production of thin-film poly-Si solar cells. |
Rights: | This is the author's version of the work. It is posted here by permission of The Japan Society of Applied Physics. Copyright (C) 2008 The Japan Society of Applied Physics. Keisuke Ohdaira, Tomoko Fujiwara, Yohei Endo, Shogo Nishizaki, and Hideki Matsumura, Japanese Journal of Applied Physics, 47(11), 2008, 8239-8242. http://jjap.ipap.jp/link?JJAP/47/8239/ |
URI: | http://hdl.handle.net/10119/8173 |
資料タイプ: | author |
出現コレクション: | c10-1. 雑誌掲載論文 (Journal Articles)
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Jpn_J_Appl_Phys_47_8239_2008.pdf | | 212Kb | Adobe PDF | 見る/開く |
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