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Title: | Fabrication of a submicron patterned electrode using an electrospun single fiber as a shadow-mask |
Authors: | Ishii, Yuya Sakai, Heisuke Murata, Hideyuki |
Keywords: | Electrospinning Submicron-gap patterned electrode Single fiber Shadow-mask |
Issue Date: | 2009-07-11 |
Publisher: | Elsevier |
Magazine name: | Thin Solid Films |
Volume: | 518 |
Number: | 2 |
Start page: | 647 |
End page: | 650 |
DOI: | 10.1016/j.tsf.2009.07.061 |
Abstract: | We realize a uniform submicron-gap electrode by using an electrospun single fiber as a shadow-mask. By stretching an electrospun fiber, we can decrease the diameter of the fiber from 2 μm to 564 nm with its standard deviation of 57.7 nm. We place the fiber on the center of a Si/SiO_2 substrate followed by the deposition of a molybdenum trioxide adhesion layer and Au electrode. After removing the fiber from the Si/SiO_2 substrate, the submicron-gap gold electrode is formed. Characterization of the gap with scanning electron microscope revealed that the gap has a good uniformity; the average gap length is 865 nm throughout 2 mm gap width. |
Rights: | NOTICE: This is the author's version of a work accepted for publication by Elsevier. Yuya Ishii, Heisuke Sakai, and Hideyuki Murata, Thin Solid Films, 518(2), 2009, 647-650, http://dx.doi.org/10.1016/j.tsf.2009.07.061 |
URI: | http://hdl.handle.net/10119/9201 |
Material Type: | author |
Appears in Collections: | c10-1. 雑誌掲載論文 (Journal Articles)
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