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このアイテムの引用には次の識別子を使用してください:
http://hdl.handle.net/10119/9882
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タイトル: | Drastic suppression of the optical reflection of flash-lamp-crystallized poly-Si films with spontaneously formed periodic microstructures |
著者: | Ohdaira, Keisuke Nishikawa, Takuya Shiba, Kazuhiro Takemoto, Hiroyuki Matsumura, Hideki |
キーワード: | Flash lamp annealing Crystallization Reflectance Polycrystalline silicon Solar cell Antireflection coatings Transmission electron microscopy Atomic force microscopy |
発行日: | 2010 |
出版者: | Elsevier |
誌名: | Thin Solid Films |
巻: | 518 |
号: | 21 |
開始ページ: | 6061 |
終了ページ: | 6065 |
DOI: | 10.1016/j.tsf.2010.05.115 |
抄録: | Polycrystalline Si (poly-Si) films formed by flash lamp annealing of precursor a-Si films on glass substrates have periodic surface roughness spontaneously formed through crystallization, which effectively acts to decrease optical reflection. The surface roughness initially decreases, and then reversely increases with increase in the duration of wet etching, performed to modulate the surface morphology and to reduce optical reflectance. This curious phenomenon can be understood as the selective removal of surface projections, which contain a number of voids, and as different etching rates of large-grain and fine-grain regions. The antireflection effect is enhanced not by the variation of the surface roughness, but rather by the removal of the voids near the surface. The etched poly-Si films covered with antireflection films show remarkably low average reflectance of 3% without any complicated texturing processes, which will lead to the fabrication of high-efficiency solar cells by a simple process. |
Rights: | NOTICE: This is the author's version of a work accepted for publication by Elsevier. Keisuke Ohdaira, Takuya Nishikawa, Kazuhiro Shiba, Hiroyuki Takemoto, and Hideki Matsumura, Thin Solid Films, 518(21), 2010, 6061-6065, http://dx.doi.org/10.1016/j.tsf.2010.05.115 |
URI: | http://hdl.handle.net/10119/9882 |
資料タイプ: | author |
出現コレクション: | c10-1. 雑誌掲載論文 (Journal Articles)
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