52 著者名表示.
| 発行日 | タイトル |
著者 |
|---|
| 12-Apr-1999 | Low-temperature crystallization of amorphous silicon using atomic hydrogen generated by catalytic reaction on heated tungsten | Heya, Akira; Masuda, Atsushi; Matsumura, Hideki |
| 1-May-1999 | Nanoscale metal transistor control of Fowler-Nordheim tunneling currents through 16 nm insulating channel | Fujimaru, Kouji; Sasajima, Ryouta; Matsumura, Hideki |
| 24-May-1999 | A metal/insulator tunnel transistor with 16 nm channel length | Sasajima, Ryouta; Fujimaru, Kouji; Matsumura, Hideki |
| 15-Jul-1999 | Anisotropic electrical conduction and reduction in dangling-bond density for polycrystalline Si films prepared by catalytic chemical vapor deposition | Niikura, Chisato; Masuda, Atsushi; Matsumura, Hideki |
| 23-Oct-2000 | Ultrathin silicon nitride gate dielectrics prepared by catalytic chemical vapor deposition at low temperatures | Sato, Hidekazu; Izumi, Akira; Matsumura, Hideki |
| 1-Nov-2000 | Identification of Si and SiH in catalytic chemical vapor deposition of SiH_4 by laser induced fluorescence spectroscopy | Nozaki, Yoshitaka; Kongo, Koichi; Miyazaki, Toshihiko; Kitazoe, Makiko; Horii, Katsuhiko; Umemoto, Hironobu; Masuda, Atsushi; Matsumura, Hideki |
| 1-Feb-2002 | Direct detection of H atoms in the catalytic chemical vapor deposition of the SiH_4/H_2 system | Umemoto, Hironobu; Ohara, Kentaro; Morita, Daisuke; Nozaki, Yoshitaka; Masuda, Atsushi; Matsumura, Hideki |
| 1-Feb-2005 | Role of Hydrogen in Polycrystalline Si by Excimer Laser Annealing | KAWAMOTO, Naoya; MATSUO, Naoto; MASUDA, Atsushi; KITAMON, Yoshitaka; MATSUMURA, Hideki; HARADA, Yasunori; MIYOSHI, Tadaki; HAMADA, Hiroki |
| 11-Mar-2005 | Air-stable n-type carbon nanotube field-effect transistors with Si_3N_4 passivation films fabricated by catalytic chemical vapor deposition | Kaminishi, Daisuke; Ozaki, Hirokazu; Ohno, Yasuhide; Maehashi, Kenzo; Inoue, Koichi; Matsumoto, Kazuhiko; Seri, Yasuhiro; Masuda, Atsushi; Matsumura, Hideki |
| 22-Feb-2006 | Rotational and vibrational state distribution of H_2 activated on a heated tungsten filament | Umemoto, Hironobu; Ansari, S. G.; Matsumura, Hideki |
| 6-Nov-2007 | High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 μs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition | Ohdaira, Keisuke; Nishizaki, Shogo; Endo, Yohei; Fujiwara, Tomoko; Usami, Noritaka; Nakajima, Kazuo; Matsumura, Hideki |
| 6-Dec-2007 | Formation of Highly Uniform Micrometer-Order-Thick Polycrystalline Silicon Films by Flash Lamp Annealing of Amorphous Silicon on Glass Substrate | Ohdaira, Keisuke; Endo, Yohei; Fujiwara, Tomoko; Nishizaki, Shogo; Matsumura, Hideki |
| 15-Jan-2008 | Poly-Si films with long carrier lifetime prepared by rapid thermal annealing of Cat-CVD amorphous silicon thin films | Ohdaira, Keisuke; Abe, Yuki; Fukuda, Makoto; Nishizaki, Shogo; Usami, Noritaka; Nakajima, Kazuo; Karasawa, Takeshi; Torikai, Tetsuya; Matsumura, Hideki |
| May-2008 | Thin film p-i-n poly-Si solar cells directly converted from p-i-n a-Si structures by a single shot of flash lamp | Ohdaira, Keisuke; Fujiwara, Tomoko; Endo, Yohei; Shiba, Kazuhiro; Takemoto, Hiroyuki; Nishizaki, Shogo; Jang, Young Rae; Nishioka, Kensuke; Matsumura, Hideki |
| 14-Nov-2008 | Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing | Ohdaira, Keisuke; Fujiwara, Tomoko; Endo, Yohei; Nishizaki, Shogo; Matsumura, Hideki |
| 30-Apr-2009 | Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealing | Ohdaira, Keisuke; Shiba, Kazuhiro; Takemoto, Hiroyuki; Fujiwara, Tomoko; Endo, Yohei; Nishizaki, Shogo; Jang, Young Rae; Matsumura, Hideki |
| 12-Jun-2009 | Drastic Improvement of Minority Carrier Lifetimes Observed in Hydrogen-Passivated Flash-Lamp-Crystallized Polycrystalline Silicon Films | Ohdaira, Keisuke; Takemoto, Hiroyuki; Shiba, Kazuhiro; Matsumura, Hideki |
| 25-Aug-2009 | Explosive crystallization of amorphous silicon films by flash lamp annealing | Ohdaira, Keisuke; Fujiwara, Tomoko; Endo, Yohei; Nishizaki, Shogo; Matsumura, Hideki |
| 2010 | Drastic suppression of the optical reflection of flash-lamp-crystallized poly-Si films with spontaneously formed periodic microstructures | Ohdaira, Keisuke; Nishikawa, Takuya; Shiba, Kazuhiro; Takemoto, Hiroyuki; Matsumura, Hideki |
| 2010 | Flash-lamp-crystallized Polycrystalline Silicon Films with Remarkably Long Minority Carrier Lifetimes | Ohdaira, Keisuke; Takemoto, Hiroyuki; Nishikawa, Takuya; Matsumura, Hideki |
| Apr-2010 | Polycrystalline Si films with unique microstructures formed from amorphous Si films by non-thermal equilibrium flash lamp annealing | Ohdaira, Keisuke; Nishikawa, Takuya; Shiba, Kazuhiro; Takemoto, Hiroyuki; Matsumura, Hideki |
| Apr-2010 | Advantage of plasma-less deposition: Cat-CVD fabrication of a-Si TFT with current drivability equivalent to poly-Si TFT | Matsumura, Hideki; Ohdaira, Keisuke; Nishizaki, Shogo |
| 20-Apr-2010 | Selection of Material for the Back Electrodes of Thin-Film Solar Cells Using Polycrystalline Silicon Films Formed by Flash Lamp Annealing | Ohdaira, Keisuke; Fujiwara, Tomoko; Endo, Yohei; Shiba, Kazuhiro; Takemoto, Hiroyuki; Matsumura, Hideki |
| 25-Jun-2010 | Variation of Crystallization Mechanisms in Flash-Lamp-Irradiated Amorphous Silicon Films | Ohdaira, Keisuke; Nishikawa, Takuya; Matsumura, Hideki |
| 30-Jun-2010 | Thin-film polycrystalline silicon solar cells formed by flash lamp annealing of a-Si films | Endo, Yohei; Fujiwara, Tomoko; Ohdaira, Keisuke; Nishizaki, Shogo; Nishioka, Kensuke; Matsumura, Hideki |
| 7-Jul-2010 | Novel technique for formation of metal lines by functional liquid containing metal nanoparticles and reduction of their resistivity by hydrogen treatment | Nguyen, Thi Thanh Kieu; Ohdaira, Keisuke; Shimoda, Tatsuya; Matsumura, Hideki |
| 26-Aug-2010 | Extremely low surface recombination velocities on crystalline silicon wafers realized by catalytic chemical vapor deposited SiNx/a-Si stacked passivation layers | Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 2011 | Microstructure of Polycrystalline Silicon Films Formed through Explosive Crystallization Induced by Flash Lamp Annealing | Ohdaira, Keisuke; Ishii, Shohei; Tomura, Naohito; Matsumura, Hideki |
| 2011 | Advantage of Plasma-Less Deposition in Cat-CVD to the Performance of Electronic Devices | Matsumura, Hideki; Hasegawa, Tomoaki; Nishizaki, Shogo; Ohdaira, Keisuke |
| 2011 | Flash-Lamp-Crystallized Polycrystalline Silicon Films with High Hydrogen Concentration Formed from Cat-CVD a-Si Films | Ohdaira, Keisuke; Tomura, Naohito; Ishii, Shohei; Matsumura, Hideki |
| 2011 | Low Resistivity Metal Lines Formed by Functional Liquids and Successive Treatment of Catalytically Generated Hydrogen Atoms in Cat-CVD System | Kieu, Nguyen Thi Thanh; Ohdaira, Keisuke; Shimoda, Tatsuya; Matsumura, Hideki |
| 2011 | Extremely Low Recombination Velocity on Crystalline Silicon Surfaces Realized by Low-Temperature Impurity Doping in Cat-CVD Technology | Hayakawa, Taro; Miyamoto, Motoharu; Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 25-Nov-2011 | Liquid-phase explosive crystallization of electron-beam-evaporated a-Si films induced by flash lamp annealing | Ohdaira, Keisuke; Matsumura, Hideki |
| 1-Jan-2012 | Polycrystalline Silicon Films with Nanometer-Sized Dense Fine Grains Formed by Flash-Lamp-Induced Crystallization | Ohdaira, Keisuke; Ishii, Shohei; Tomura, Naohito; Matsumura, Hideki |
| 6-Feb-2012 | Passivation characteristics of SiNx/a-Si and SiNx/Si-rich-SiNx stacked layers on crystalline silicon | Thi, Trinh Cham; Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 26-Apr-2012 | Scanning transmission electron microscope analysis of amorphous-Si insertion layers prepared by catalytic chemical vapor deposition, causing low surface recombination velocities on crystalline silicon wafers | Higashimine, Koichi; Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki; Otsuka, N. |
| 22-Oct-2012 | Large-Grain Polycrystalline Silicon Films Formed through Flash-Lamp-Induced Explosive Crystallization | Ohdaira, Keisuke; Sawada, Keisuke; Usami, Noritaka; Varlamov, Sergey; Matsumura, Hideki |
| 23-Oct-2012 | Flash-lamp-induced explosive crystallization of amorphous germanium films leaving behind periodic microstructures | Ohdaira, Keisuke; Matsumura, Hideki |
| 22-Jan-2014 | Passivation quality of a stoichiometric SiN_x single passivation layer on crystalline silicon prepared by catalytic chemical vapor deposition and successive annealing | Thi, Trinh Cham; Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 2-Apr-2014 | Deposition of moisture barrier films by catalytic CVD using hexamethyldisilazane | Ohdaira, Keisuke; Matsumura, Hideki |
| 28-Jul-2014 | Drastic reduction in the surface recombination velocity of crystalline silicon passivated with catalytic chemical vapor deposited SiN_x films by introducing phosphorous catalytic-doped layer | Trinh, Cham Thi; Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 16-Sep-2014 | Cat-doping: Novel method for phosphorus and boron shallow doping in crystalline silicon at 80 °C | Matsumura, Hideki; Hayakawa, Taro; Ohta, Tatsunori; Nakashima, Yuki; Miyamoto, Motoharu; Trinh, Cham Thi; Koyama, Koichi; Ohdaira, Keisuke |
| 10-Jun-2015 | Improvement in passivation quality and open-circuit voltage in silicon heterojunction solar cells by the catalytic doping of phosphorus atoms | Tsuzaki, Shogo; Ohdaira, Keisuke; Oikawa, Takafumi; Koyama, Koichi; Matsumura, Hideki |
| 7-Jul-2015 | Application of crystalline silicon surface oxidation to silicon heterojunction solar cells | Oikawa, Takafumi; Ohdaira, Keisuke; Higashimine, Koichi; Matsumura, Hideki |
| 22-Jan-2016 | Defect termination on crystalline silicon surfaces by hydrogen for improvement in the passivation quality of catalytic chemical vapor-deposited SiN_x and SiN_x/P catalytic-doped layers | Thi, Trinh Cham; Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 3-Mar-2016 | Catalytic doping of phosphorus and boron atoms on hydrogenated amorphous silicon films | Seto, Junichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 3-Jun-2016 | Suppression of the epitaxial growth of Si films in Si heterojunction solar cells by the formation of ultra-thin oxide layers | Ohdaira, Keisuke; Oikawa, Takafumi; Higashimine, Koichi; Matsumura, Hideki |
| 4-Jul-2017 | Catalytic phosphorus and boron doping of amorphous silicon films for application to silicon heterojunction solar cells | Ohdaira, Keisuke; Seto, Junichi; Matsumura, Hideki |
| 11-Sep-2017 | Passivation of textured crystalline silicon surfaces by catalytic CVD silicon nitride films and catalytic phosphorus doping | Ohdaira, Keisuke; Cham, Trinh Thi; Matsumura, Hideki |
| 30-Oct-2017 | Super water-repellent treatment of various cloths by deposition of catalytic-CVD polytetrafluoroethylene films | Matsumura, Hideki; Mishiro, Mai; Takachi, Michihisa; Ohdaira, Keisuke |
| 17-Jul-2018 | High-quality surface passivation of crystalline silicon with chemical resistance and optical transparency by using catalytic chemical vapor deposition SiN_x layers and an ultrathin SiO_x film | Tu, Huynh Thi Cam; Koyama, Koichi; Nguyen, Cong Thanh; Ohdaira, Keisuke; Matsumura, Hideki |
| 21-May-2019 | Conversion of the conduction type of a catalytic-chemical-vapor-deposited p-type a-Si by PH_3 plasma ion implantation | Tu, Huynh-Thi-Cam; Koyama, Koichi; Yamaguchi, Noboru; Suzuki, Hideo; Ohdaira, Keisuke; Matsumura, Hideki |
